جيفينج سيراميك
التطبيقات النموذجية & Solutions
Semiconductor Wet Processing Equipment
l Etchant Transfer Pump: Laminar/turbulent flow control; flow fluctuation < ±1.5%; HF/HNO₃ resistant; ion contamination < 0.1 ppb.
l CMP Slurry Circulation Pump: Nano‑finished surface (Ra ≤ 0.05 ميكرومتر); resists abrasive particles; service life > 20,000 hours.
New Energy Sector
l Fuel Cell Hydrogen Recirculation Pump: Zero hydrogen embrittlement; hydrogen permeability < 1×10⁻¹⁰ mol/(m²·s·Pa); optional Pt/Ru conductive coating.
l Sodium-Sulfur Battery Molten Salt Pump: Resists 400°C molten sulfur & liquid sodium; thermal shock resistant (ΔT=800°C→room temp, 50 cycles no cracking).
Special Industrial Systems
l High-Temperature Molten Salt Heat Transfer Pump: Resists 600°C nitrate/chloride molten salt; low thermal expansion (6.5×10⁻⁶/°C).
l Nuclear Waste Treatment Pump: Gamma radiation resistant (>10⁶ Gy); zero radioactive adsorption; decontamination factor > 10³.
Customization Services
Precision Adapted Design
Flow field simulation (ANSYS Fluent); Al₂O₃-ZrO₂ composite toughening (fracture toughness up to 8 MPa·m¹ᐟ²).
Advanced Manufacturing
Micro-pore grouting (min. flow width 0.2 مم, tolerance ±0.01 mm); atmosphere sintering (O₂ < 5 ppm).
Full‑Process Quality Control
Helium leak detection (sensitivity 10⁻¹² Pa·m³/s); particle counting (ISO Class 4 cleanroom standard).