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Silicon Carbide Mirror | High-Precision Optical Ceramic

Ceramic Structural Components/

كربيد السيليكون (كربيد كربيد) Mirror

Silicon Carbide Mirror

The silicon carbide mirrors are extremely efficient optical substrates that are made by the process of reaction bonds (RB-SiC) also known as chemical vapor deposition (CVD-SiC).

The key features are:

  • Thermal expansion that is near-zero (1.5x10-6/degC)
  • Extremely high thermal conductivity (200 W/m*K)
  • Sub-nanometer roughness of the surface (Ra = 0.5 millimeters)

Built for the most demanding of applications like space telescopes, high-power lasers semiconductor lithography, the infrared systems for optical, they offer outstanding stability even under the most extreme temperatures and radiation as well as mechanical loads. A cutting-edge replacement to glass and metal mirrors and glass mirrors, our silicon carbide round mirrors provide reliability even in the toughest conditions.

  • تفاصيل المنتج
  • المواصفات الفنية

Core Advantages Of Silicon Carbide Mirror

Extreme thermal stability

CTE < 2×10⁻⁶/°C (20–400°C); thermal deformation only 1/50 of glass mirrors.

Ultra-high thermal conductivity

200 W/m·K, eliminates thermal lens effect for kW-class lasers.

Ultra-precision optical surface

Ra ≤ 0.5 nm after polishing; reflectivity > 99.5% @ 1064 nm (coated).

خفيف الوزن & high rigidity

كثافة 3.1 جم/سم3; bending strength ≥ 400 MPa; specific stiffness (E/ρ) 4× that of fused silica.

Full environmental resistance

Radiation & acid/alkali resistant; operating temp: -200°C to 1650°C.

Applications Of Silicon Carbide Mirrors

1. High-Energy Laser Systems

  • Laser cutting focusing mirrors, fiber laser cavity mirrors, ultrafast laser chirp mirrors.
  • Directed energy weapon mirrors, laser fusion beam steering mirrors.

2. الفضاء الجوي & Astronomy

  • Space telescope primary/secondary mirrors, satellite multispectral imagers, deep-space infrared lenses.
  • Ground observatory mirrors, satellite laser communication mirrors.

3. أشباه الموصلات & Precision Manufacturing

  • EUV lithography mirror substrates, wafer inspection interferometer mirrors.
  • Infrared camera windows, highprecision metrology reference mirrors

4. Research & Special Environments

  • Synchrotron beamline mirrors, nuclear reactor neutron optics, high-temp industrial monitoring mirrors.

Why Choose Our Silicon Carbide Mirrors?

Leading materials & processes

CVD‑SiC for EUV‑level ultra‑precision; RB‑SiC for low‑cost large‑scale lightweight structures.

Full‑process quality control

Zygo interferometer surface testing, white‑light profiler roughness analysis, laser damage threshold testing (ايزو 21254).

One‑stop customization

Aspherical, freeform, micro‑structured mirrors; blank‑polish‑coat‑assembly integration.

Global technical support

Optical design, thermal simulation, on‑orbit performance monitoring.

المعلمةتفاصيل
نوع المادةReaction Bonded SiC (RB-SiC), Chemical Vapor Deposition SiC (CVD-SiC)
Mirror Diameter10–1500 mm (معيار); over 2 m available for custom
Surface Accuracyλ/20 @ 632.8 nm (RMS); λ/10 PV (high-energy laser grade)
خشونة السطحRa ≤ 0.5 nm (after polishing & coating)
CTE (20–400°C)1.5–4.2×10⁻⁶/°C (depends on process)
Coating OptionsAu, Ag, dielectric HR (1064 nm / 10.6 ميكرومتر), laser-resistant coating (>10 kW/cm²)
الشهاداتايزو 10110, MIL-PRF-13830, NASA low outgassing (ASTM E595)

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