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Semiconductor Equipment Components -JiFeng Ceramics

セラミック構造部品/

半導体装置部品

Semiconductor Equipment Components are manufactured from high-purity ceramics (Al₂O₃/AlN/SiC/Si₃N₄/ZrO₂) or special alloys (Invar/AlSiC) via precision machining and surface treatment. They meet the strict requirements of semiconductor manufacturing for cleanliness, 耐食性, および熱安定性, and are widely used in wafer handling, etching, deposition, lithography, and testing equipment.

  • 製品詳細
  • 技術仕様

Core Advantages Of Ceramic 半導体装置部品

Nanometer‑Level Precision

Flatness ≤0.005mm, 表面粗さRa≦0.1μm, ideal for wafer transfer & lithography alignment.

極限環境耐性

動作温度 800 ~ 1600°C; plasma & 耐酸性/耐アルカリ性 (pH 1 ~ 14); service life ×5+ vs metal.

Ultra-High Cleanliness

Metal ion leaching ≤1ppm; no particle shedding (NAS 1638 クラス 1); EUV & high-purity process compatible.

Excellent Thermal Management

AlN thermal conductivity ≥170W/m·K; CTE matches silicon (4.5×10⁻⁶/℃), reduces thermal stress.

代表的な用途 & Material Selection

1. Wafer Transport & サポート

ウェーハチャック

材料: アルミナ (Al₂O₃, purity ≥99.5%) or Silicon Carbide (SiC, purity ≥99.9%).
パフォーマンス: Electrostatic adsorption force ≥0.1MPa, flatness ≤0.003mm, compatible with thinning and bonding of 12-inch wafers.

Vacuum Chamber Flange

材料: 窒化アルミニウム (AlN, thermal conductivity ≥170W/m·K).
パフォーマンス: Gas tightness ≤1×10⁻⁹ Pa·m³/s, suitable for etching and PVD equipment.

2. Gas Distribution & Reaction Control

Gas Distribution Plate

材料: イットリア安定化ジルコニア (YSZ), resistant to plasma erosion.
パフォーマンス: Micropore diameter tolerance ±0.005mm, uniformity error ±2%.

Heater Base

材料: 炭化ケイ素 (SiC), temperature resistance up to 1600°C.
パフォーマンス: Resistance uniformity ≤±1%, designed for MOCVD epitaxial growth.

3. リソグラフィー & Inspection Equipment

EUV Optical Lens Base

材料: Low-expansion Invar Alloy, CTE ≤1×10⁻⁶/°C.
パフォーマンス: Thermal stability ±0.01μm/°C, compatible with processes below 7nm.

Wafer Alignment Stage

材料: Lightweight AlSiC ceramic composite.
パフォーマンス: Repeat positioning accuracy ±10nm, matches lithography focusing systems.

Why Partner with JiFeng Ceramics?

Material Selection

アルミナ / 窒化アルミニウム / 炭化ケイ素 / Special Alloys, compatible with diverse semiconductor process requirements.

プロセスの最適化

Precision grinding (tolerance ±0.001mm) and CVD coating for superior wear and plasma resistance.

機能統合

Embedded electrodes and sensors, matching intelligent temperature control and real-time monitoring systems.

コストメリット

Adopts domestic high-purity powder and machining technologies, 輸入ブランドよりも30%~50%安い価格でご提供します.

アイテム詳細
セラミックス材料Si₃N₄, Al₂O₃, ZrO₂, AlN, SiC
加工精度±0.01mm; Flatness 0.003mm; Parallelism 0.005mm
Key PropertiesWear-resistant, high temp resistant, 高硬度, 絶縁, anti-corrosion
Colors白, beige, black
カスタマイズCustomizable per customer drawing

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