吉峰陶磁器
Typical Applications of Alumina Ceramic Pump Core
Semiconductor Wet Processing Equipment
- Etchant Transfer Pump: Laminar/turbulent flow control; flow fluctuation < ±1.5%; HF/HNO₃ resistant; ion contamination < 0.1 ppb.
- CMP Slurry Circulation Pump: Nano‑finished surface (Ra ≤ 0.05 μm); resists abrasive particles; 耐用年数 > 20,000 時間.
New Energy Sector
- Fuel Cell Hydrogen Recirculation Pump: Zero hydrogen embrittlement; hydrogen permeability < 1×10⁻¹⁰ mol/(m²·s·Pa); optional Pt/Ru conductive coating.
- Sodium-Sulfur Battery Molten Salt Pump: Resists 400°C molten sulfur & liquid sodium; thermal shock resistant (ΔT=800°C→room temp, 50 cycles no cracking).
Special Industrial Systems
- High-Temperature Molten Salt Heat Transfer Pump: Resists 600°C nitrate/chloride molten salt; 低い熱膨張 (6.5×10⁻⁶/℃).
- Nuclear Waste Treatment Pump: Gamma radiation resistant (>10⁶ ガイ); zero radioactive adsorption; decontamination factor > 10³.
吉峰陶磁器 Customization Services
Precision Adapted Design
Flow field simulation (ANSYS Fluent); Al₂O₃-ZrO₂ composite toughening (破壊靱性まで 8 MPa・m¹ᐟ²).
Advanced Manufacturing
Micro-pore grouting (分. flow width 0.2 mm, tolerance ±0.01 mm); atmosphere sintering (O₂ < 5 ppm).
全工程の品質管理
Helium leak detection (sensitivity 10⁻¹² Pa·m³/s); particle counting (ISOクラス 4 cleanroom standard).
